Monthly Archives: October 2013

SJ-20 Evaporator

&laquo Back to Equipment Table of Contents [Hide/Show] System Overview   Tool Capabilities/Limitations   Substrate RequirementsSupported ProcessesOperationTool Maintenance/QualificationTool Location SJ-20 Evaporator System Overview¶ The SJ-20 is an E-beam evaporator used for depositing Ge, Au, Ni and Ti. The tool uses electrons created by a filament and accelerates them onto the top surface of the metal. These electrons heat the [...]

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Oxford ALD

&laquo Back to Equipment Table of Contents [Hide/Show] AnnouncementsSystem Overview   Tool Capabilities/Limitations   Substrate RequirementsSupported ProcessesOperation   Tool Checkout ProcedureTool Maintenance/QualificationTool Location Announcements¶ Oxford ALD System Overview¶ Describe what the tool does, make links to the materials it processes Tool Capabilities/Limitations¶ Materials Processed Material restrictions Harware Details Power specs Chemicals Gases Capabilities Resolution Aspect Ratio Thickness range Substrate Requirements¶ Sample [...]

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Low-Cost qMicro Released By Izon Science

Nanotechnology instrument manufacturer Izon Science today released qMicro, a new low-cost product for accurate sizing and counting of cells and micro-scale particles. “The qMicro applies... AZoNano.com - Nanotechnology News Feed

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Nonstandard Organic

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NIMS and NanoNextNL Enter Comprehensive Collaborative Agreement

NanoNextNL is a consortium of more than one hundred Dutch companies, universities, knowledge institutes and university medical centers, which is aimed at industry driven research into micro and... AZoNano.com - Nanotechnology News Feed

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1440B

Silicon Bay Acid Bench. Aluminum etch (Transene Type A Al etchant) HF (1:1 49% HF:H2O) Chromium etch for masks (Cyantek CR-14 Cr etchant) Chromium etch for wafers (Cyantek CR-14 Cr etchant) Other acid-based processes¶ Aqua Regia Ti etch pad etch, etc. To determine if a process has been approved, see the database of approved processes [...]

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Nanostrip

&laquo Back to Chemicals Table of Contents [Hide/Show] DescriptionProcesses   Process SOPsEquipmentData SheetMSDSReferences Description¶ Nanostrip is a stabilized mixture of sulfuric acid and hydrogen peroxide. Nanostrip will not attack chrome, chromium oxide, gold, silicon or silicon dioxide. It has minimal effect of tantalum silicide, titanium tungsten, ITO, aluminum and aluminum alloys. Processes¶ Photoresist removal Substrate cleaning Mask [...]

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Picodeon Announce First Pulsed Laser Deposition Equipment for Volume Production

Finnish thin film coating specialist Picodeon Ltd Oy has developed the world’s first production equipment for the use of pulsed laser deposition (PLD) in volume manufacturing. The Picodeon... AZoNano.com - Nanotechnology News Feed

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Mask Bench 13

« Back to Equipment Table of Contents [Hide/Show] Description   Tool Capabilities/Limitations   Wafer Requirements   Supported Recipes/ProcessesOperationTool Maintenance/QualificationTool Location Mask 13 Description¶ This wet bench is dedicated to processing and cleaning masks.  It is used to etch Chrome (Cr) and removing photo resists (PR) from masks.  Tool Capabilities/Limitations¶ Soda lime or quartz mask only This bench has two tanks in [...]

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Probing Light Interaction with Nano-Antennas Using Strained Graphene

Graphene can be used to investigate how light interacts with nano-antennas, potentially increasing the efficiency of solar cells and photo detectors, University of Manchester researchers have found... AZoNano.com - Nanotechnology News Feed

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